In 1970 when I first seriously contemplated writing a book on electron spectroscopy, I recognized the impossibility of completely reaching my desired goals. First, the field was expanding (and still is) at such a rate that a definitive statement of the subject is not possible. The act of following the literature comprehensively and summarizing its essential content proved to be a diver gent series. On the other hand, the field has increased to such a size that violent changes in its basic makeup no longer occur with the frequency that was present in its early days. Furthermore, the excitement of electron spectro scopy lies in its many-faceted interrelationships. In the era of specialization, electron spectroscopy is an open-ended subject continually bringing together new aspects of science. I wished to discuss not just one type of electron spectro scopy, but as many as would be possible. The book as it stands concentrates its attention on x-ray photoelectron spectroscopy, but also presents the basis of Auger electron spectroscopy and uv photoelectron spectroscopy, as well as mentioning many of the other branches of the field. A large, many-author volume might be an answer to some of these problems. However, though anyone person possesses only a limited amount of expertise, I have always enjoyed books by a single author since what they lack in detailed knowledge they gain in a unified viewpoint. I hope the final product, though limited in its attainment of these goals, will still be of some merit.

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

Practical Materials Characterization covers the most common materials analysis techniques in a single volume. It stands as a quick reference for experienced users, as a learning tool for students, and as a guide for the understanding of typical data interpretation for anyone looking at results from a range of analytical techniques. The book includes analytical methods covering microstructural, surface, morphological, and optical characterization of materials with emphasis on microscopic structural, electronic, biological, and mechanical properties. Many examples in this volume cover cutting-edge technologies such as nanomaterials and life sciences.

The aim of this text is to present the background, the important concepts, and tabulated data of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) in a practical context for those involved in applied surface analysis techniques.

Ultraviolet Photoelectron and Photoion Spectroscopy, Auger Electron Spectroscopy, Plasma Excitation in Spectrochemical Analysis