本书讨论的主题包括晶格和电子缺陷、掺杂效应、非化学计量性以及质量与电荷的输运,并特别强调了成分元素的一般化学性能与它们的化合物的缺陷化学和输运性能之间的关系。

The Defect Chemistry of Metal Oxides is a unique introduction to the equilibrium chemistry of solid inorganic compounds with a focus on metal oxides. Accessible to students with little or no background in defect chemistry, it explains how to apply basic principles and interpret the related behavior of materials. Topics discussed include lattice and electronic defects, doping effects, nonstoichiometry, and mass and charge transport. The text distinctly emphasizes the correlation between the general chemical properties of the constituent elements and the defect chemistry and transport properties of their compounds. It covers the types of defects formed, the effects of dopants, the amount and direction of nonstoichiometry, the depths of acceptor and donor levels, and more. Concluding chapters present up-to-date and detailed analyses of three systems: titanium dioxide, cobalt oxide and nickel oxide, and barium titanate. The Defect Chemistry of Metal Oxides is the only book of its kind that incorporates sample problems for students to solve. Suitable for a variety of courses in materials science and engineering, chemistry, and geochemistry, it also serves as a valuable reference for researchers and instructors.

DEFECTS AND TRANSPORT IN OXIDES is the proceedings of the eighth Battelle Colloquium in the Materials Sciences, held in Columbus and Salt Fork, Ohio, September 17-22, 1973. It took as its theme the relationship between defects and transport of both mass and charge in oxides. Applications of defect-controlled transport to a number of important processes in oxides also were covered. In selecting this topic, the Organizing Committee thought that 1973 was timely to bring together the leading theoretical and experimental researchers in the oxide transport field to review its status in a critical way, and to consider current major research directions and how research in the future might be guided into fruitful areas. The meeting was highlighted by the presentation of several papers which suggest that major advances in our understanding of transport in oxides appear to be imminent. These papers dealt with the results of new theoretical approaches whereby the energies and configurations of defects may be calculated, and with new experimental techniques for indirectly observing these defects, previously thought to be below the limits of experimental resolving power. Other papers, dealing with the application of defect chemistry to technological processes, served to demonstrate the successes and to point out yet unresolved problems associated with ix x PREFACE understanding the chemistry of imperfect crystals.

This book presents the basics and characterization of defects at oxide surfaces. It provides a state-of-the-art review of the field, containing information to the various types of surface defects, describes analytical methods to study defects, their chemical activity and the catalytic reactivity of oxides. Numerical simulations of defective structures complete the picture developed. Defects on planar surfaces form the focus of much of the book, although the investigation of powder samples also form an important part. The experimental study of planar surfaces opens the possibility of applying the large armoury of techniques that have been developed over the last half-century to study surfaces in ultra-high vacuum. This enables the acquisition of atomic level data under well-controlled conditions, providing a stringent test of theoretical methods. The latter can then be more reliably applied to systems such as nanoparticles for which accurate methods of characterization of structure and electronic properties have yet to be developed. The book gives guidance to tailor oxide surfaces by controlling the nature and concentration of defects. The importance of defects in the physics and chemistry of metal oxide surfaces is presented in this book together with the prominent role of oxides in common life. The book contains contributions from leaders in the field. It serves as a reference for experts and beginners in the field.

The properties of materials at high temperature play a vital role in their processing and practical use. The real properties of materials at elevated temperatures are very often governed by defects in their structure. Lattice defects may consist of point defects like vacancies, interstitial atoms or substituted atoms. These classes are discussed in general and specifically for oxides, nitrides, carbides and sulfides. Defect aggregates, shear structures and adaptive structures are also described. Special attention is paid to hydrogen defects which seem to play an important role in several materials.Defects in solids lead to transport properties such as diffusion and conductivity. These themes are thoroughly treated in this book, with examples from various materials being provided. Special attention is paid to the transport properties of grain boundaries. In high temperature corrosion and other types of oxidation, the diffusion of atoms through the reaction products is often the rate limiting step of the reaction. This book takes the reader from the theoretical treatment of defects to applications in high temperature corrosion. Reactions between metals and pure oxygen lead to the formation of oxides on the surface, and the reaction rates may often be related to the diffusion coefficients of the oxide. However, in practical use alloys are subjected to other severe gaseous atmospheres which may often lead to accelerated attack on the material. The severest condition, namely where a salt deposit is combined with oxidizing gases, is called hot corrosion. This and other types of corrosion are also covered. Finally, a chapter is devoted to the prevention of corrosive attack on materials by the addition of rare earth metals.The book has been published in honour of Professor Per Kofstad on the occasion of his 60th birthday. Professor Kofstad has for many years been active in the field of high temperature chemistry in all its aspects, from basic and theoretical work to its application in high temperature corrosion of metals and alloys. The various chapters have been contributed by his friends and colleagues, all of whom are international experts in the field.

The chemistry of metals has traditionally been more understood than that of its oxides. As catalytic applications continue to grow in a variety of disciplines, Metal Oxides: Chemistry and Applications offers a timely account of transition-metal oxides (TMO), one of the most important classes of metal oxides, in the context of catalysis. The

Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.