The new 4th edition of Seborg’s Process Dynamics Control provides full topical coverage for process control courses in the chemical engineering curriculum, emphasizing how process control and its related fields of process modeling and optimization are essential to the development of high-value products. A principal objective of this new edition is to describe modern techniques for control processes, with an emphasis on complex systems necessary to the development, design, and operation of modern processing plants. Control process instructors can cover the basic material while also having the flexibility to include advanced topics.

Publisher Description

B> Covers PLCs, process control, sensors, robotics, fluid power, CNC, Lockout/Tagout and safety, and more. Offers such a wide array of topics that readers can use this book as a reference for many different issues in industrial automation. Featuring the greatest breadth and depth of coverage available on the subject, this practical book explores the main topics in industrial automation; and provides a much-needed, understandable discussion of process control. A comprehensive reference for professionals in industrial automation.

This expanded new edition is specifically designed to meet the needs of the process industry, and closes the gap between theory and practice. Back-to-basics approach, with a focus on techniques that have an immediate practical application, and heavy maths relegated to the end of the book Written by an experienced practitioner, highly regarded by major corporations, with 25 years of teaching industry courses Supports the increasing expectations for Universities to teach more practical process control (supported by IChemE)

A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.

This book is aimed at engineers and technicians who need to have a clear, practical understanding of the essentials of process control, loop tuning and how to optimize the operation of their particular plant or process. The reader would typically be involved in the design, implementation and upgrading of industrial control systems. Mathematical theory has been kept to a minimum with the emphasis throughout on practical applications and useful information. This book will enable the reader to: * Specify and design the loop requirements for a plant using PID control * Identify and apply the essential building blocks in automatic control * Apply the procedures for open and closed loop tuning * Tune control loops with significant dead-times * Demonstrate a clear understanding of analog process control and how to tune analog loops * Explain concepts used by major manufacturers who use the most up-to-date technology in the process control field · A practical focus on the optimization of process and plant · Readers develop professional competencies, not just theoretical knowledge · Reduce dead-time with loop tuning techniques

A thorough overview of all aspects of chemical process control - process modeling, dynamic analyses of processing systems, a large variety of control schemes, synthesis of multivariable control configurations for single units and complete chemical plants, analysis and design of digital computer control systems.