This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered, with an emphasis on practical laboratory implementation. Basic device physics merged with photoemission studies from single- and polycrystalline materials are described. Extensions to new methods for extracting key device properties of metal-oxide-semiconductor structures, including band offsets, effective work functions, semiconductor band bending and defect-related charging in a number of technologically important gate oxides are detailed. Polycrystalline photovoltaic materials and heterostructures as well as organic light emitting materials are covered. This book describes both the history, and most recent applications of ultrafast laser science to industrially relevant materials, processes and devices.

This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered, with an emphasis on practical laboratory implementation. Basic device physics merged with photoemission studies from single- and polycrystalline materials are described. Extensions to new methods for extracting key device properties of metal-oxide-semiconductor structures, including band offsets, effective work functions, semiconductor band bending and defect-related charging in a number of technologically important gate oxides are detailed. Polycrystalline photovoltaic materials and heterostructures as well as organic light emitting materials are covered. This book describes both the history, and most recent applications of ultrafast laser science to industrially relevant materials, processes and devices."

Covering high-energy ultrafast amplifiers and solid-state, fiber, and diode lasers, this reference examines recent developments in high-speed laser technology. It presents a comprehensive survey of ultrafast laser technology, its applications, and future trends in various scientific and industrial areas. Topics include: micromachining applications for metals, dielectrics, and biological tissue; advanced electronics and semiconductor processing; optical coherence tomography; multiphoton microscopy; optical sampling and scanning; THz generation and imaging; optical communication systems; absolute phase control of optical signals; and more.

Ultrashort laser pulses with durations in the femtosecond range up to a few picoseconds provide a unique method for precise materials processing or medical applications. Paired with the recent developments in ultrashort pulse lasers, this technology is finding its way into various application fields. The book gives a comprehensive overview of the principles and applications of ultrashort pulse lasers, especially applied to medicine and production technology. Recent advances in laser technology are discussed in detail. This covers the development of reliable and cheap low power laser sources as well as high average power ultrashort pulse lasers for large scale manufacturing. The fundamentals of laser-matter-interaction as well as processing strategies and the required system technology are discussed for these laser sources with respect to precise materials processing. Finally, different applications within medicine, measurement technology or materials processing are highlighted.

Covering high-energy ultrafast amplifiers and solid-state, fiber, and diode lasers, this reference examines recent developments in high-speed laser technology. It presents a comprehensive survey of ultrafast laser technology, its applications, and future trends in various scientific and industrial areas. Topics include: micromachining applications

The laser has revolutionized many areas of science and society, providing bright and versatile light sources that transform the ways we investigate science and enables trillions of dollars of commerce. Now a second laser revolution is underway with pulsed petawatt-class lasers (1 petawatt: 1 million billion watts) that deliver nearly 100 times the total world's power concentrated into a pulse that lasts less than one-trillionth of a second. Such light sources create unique, extreme laboratory conditions that can accelerate and collide intense beams of elementary particles, drive nuclear reactions, heat matter to conditions found in stars, or even create matter out of the empty vacuum. These powerful lasers came largely from U.S. engineering, and the science and technology opportunities they enable were discussed in several previous National Academies' reports. Based on these advances, the principal research funding agencies in Europe and Asia began in the last decade to invest heavily in new facilities that will employ these high-intensity lasers for fundamental and applied science. No similar programs exist in the United States. Opportunities in Intense Ultrafast Lasers assesses the opportunities and recommends a path forward for possible U.S. investments in this area of science.