Ellipsometry is a unique optical technique of great sensitivity for in situ non-destructive characterization of surface (inter-facial) phenomena (reactions) utilizing the change in the state of polarization of a light-wave probe. Although known for almost a century, the use of ellipsometry has increased rapidly in the last two decades. Among the most significant recent developments are new applications, novel and automated instrumentation and techniques for error-free data analysis. This book provides the necessary analytical and experimental tools needed for competent understanding and use of these developments. It is directed to those who are already working in the field and, more importantly, to the newcomer who would otherwise have to sift through several hundred published papers. The authors first present a comprehensive study of the different mathematical representations of polarized light and how such light is processed by optical systems, going on to show how these tools are applied to the analysis of ellipsometer systems. To relate ellipsometric measurements to surface properties, use is then made of electromagnetic theory. Experimental techniques and apparatus are described and the many interesting applications of ellipsometry to surface and thin-film phenomena are reviewed. This reference work is addressed to researchers and students with a strong interest in surface and thin-film physics and optics and their applications. It is a must for libraries in the fields of solid state physics, physical chemistry, electro-chemistry, metallurgy and optical engineering.

Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.

Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control which have attracted significant attention in various scientific and industrial fields.

Polarized Light, Second Edition explores polarized light, its production, and its use, facilitating self-study without prior knowledge of Maxwell's equations. This comprehensive second edition includes more than 2500 thoroughly updated figures and equations for easier understanding and application across various industries. It features new chapters on polarization by refraction and reflection, polarization elements, anisotropic materials, Stokes polarimetry, Mueller matrix polarimetry, the mathematics of the Mueller matrix. This edition also offers updated and expanded material on the derivation of the Fresnel equations with plots of the magnitude and phase of the reflection coefficients.

Provides a semi-quantitative approach to recent developments in the study of optical properties of condensed matter systems Featuring contributions by noted experts in the field of electronic and optoelectronic materials and photonics, this book looks at the optical properties of materials as well as their physical processes and various classes. Taking a semi-quantitative approach to the subject, it presents a summary of the basic concepts, reviews recent developments in the study of optical properties of materials and offers many examples and applications. Optical Properties of Materials and Their Applications, 2nd Edition starts by identifying the processes that should be described in detail and follows with the relevant classes of materials. In addition to featuring four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry, the book covers: optical properties of disordered condensed matter and glasses; concept of excitons; photoluminescence, photoinduced changes, and electroluminescence in noncrystalline semiconductors; and photoinduced bond breaking and volume change in chalcogenide glasses. Also included are chapters on: nonlinear optical properties of photonic glasses; kinetics of the persistent photoconductivity in crystalline III-V semiconductors; and transparent white OLEDs. In addition, readers will learn about excitonic processes in quantum wells; optoelectronic properties and applications of quantum dots; and more. Covers all of the fundamentals and applications of optical properties of materials Includes theory, experimental techniques, and current and developing applications Includes four new chapters on optoelectronic properties of organic semiconductors, recent advances in electroluminescence, perovskites, and ellipsometry Appropriate for materials scientists, chemists, physicists and electrical engineers involved in development of electronic materials Written by internationally respected professionals working in physics and electrical engineering departments and government laboratories Optical Properties of Materials and Their Applications, 2nd Edition is an ideal book for senior undergraduate and postgraduate students, and teaching and research professionals in the fields of physics, chemistry, chemical engineering, materials science, and materials engineering.