To anyone who is interested in surface chemical analysis of materials on the nanometer scale, this book is prepared to give appropriate information. Based on typical application examples in materials science, a concise approach to all aspects of quantitative analysis of surfaces and thin films with AES and XPS is provided. Starting from basic principles which are step by step developed into practically useful equations, extensive guidance is given to graduate students as well as to experienced researchers. Key chapters are those on quantitative surface analysis and on quantitative depth profiling, including recent developments in topics such as surface excitation parameter and backscattering correction factor. Basic relations are derived for emission and excitation angle dependencies in the analysis of bulk material and of fractional nano-layer structures, and for both smooth and rough surfaces. It is shown how to optimize the analytical strategy, signal-to-noise ratio, certainty and detection limit. Worked examples for quantification of alloys and of layer structures in practical cases (e.g. contamination, evaporation, segregation and oxidation) are used to critically review different approaches to quantification with respect to average matrix correction factors and matrix relative sensitivity factors. State-of-the-art issues in quantitative, destructive and non-destructive depth profiling are discussed with emphasis on sputter depth profiling and on angle resolved XPS and AES. Taking into account preferential sputtering and electron backscattering corrections, an introduction to the mixing-roughness-information depth (MRI) model and its extensions is presented.

The idea for this book stemmed from a remark by Philip Jennings of Murdoch University in a discussion session following a regular meeting of the Australian Surface Science group. He observed that a text on surface analysis and applica tions to materials suitable for final year undergraduate and postgraduate science students was not currently available. Furthermore, the members of the Australian Surface Science group had the research experience and range of coverage of sur face analytical techniques and applications to provide a text for this purpose. A of techniques and applications to be included was agreed at that meeting. The list intended readership of the book has been broadened since the early discussions, particularly to encompass industrial users, but there has been no significant alter ation in content. The editors, in consultation with the contributors, have agreed that the book should be prepared for four major groups of readers: - senior undergraduate students in chemistry, physics, metallurgy, materials science and materials engineering; - postgraduate students undertaking research that involves the use of analytical techniques; - groups of scientists and engineers attending training courses and workshops on the application of surface analytical techniques in materials science; - industrial scientists and engineers in research and development seeking a description of available surface analytical techniques and guidance on the most appropriate techniques for particular applications. The contributors mostly come from Australia, with the notable exception of Ray Browning from Stanford University.

Provides a concise yet comprehensive introduction to XPS and AES techniques in surface analysis This accessible second edition of the bestselling book, An Introduction to Surface Analysis by XPS and AES, 2nd Edition explores the basic principles and applications of X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES) techniques. It starts with an examination of the basic concepts of electron spectroscopy and electron spectrometer design, followed by a qualitative and quantitative interpretation of the electron spectrum. Chapters examine recent innovations in instrument design and key applications in metallurgy, biomaterials, and electronics. Practical and concise, it includes compositional depth profiling; multi-technique analysis; and everything about samples—including their handling, preparation, stability, and more. Topics discussed in more depth include peak fitting, energy loss background analysis, multi-technique analysis, and multi-technique profiling. The book finishes with chapters on applications of electron spectroscopy in materials science and the comparison of XPS and AES with other analytical techniques. Extensively revised and updated with new material on NAPXPS, twin anode monochromators, gas cluster ion sources, valence band spectra, hydrogen detection, and quantification Explores key spectroscopic techniques in surface analysis Provides descriptions of latest instruments and techniques Includes a detailed glossary of key surface analysis terms Features an extensive bibliography of key references and additional reading Uses a non-theoretical style to appeal to industrial surface analysis sectors An Introduction to Surface Analysis by XPS and AES, 2nd Edition is an excellent introductory text for undergraduates, first-year postgraduates, and industrial users of XPS and AES.

SPECTROSCOPY FOR MATERIALS CHARACTERIZATION Learn foundational and advanced spectroscopy techniques from leading researchers in physics, chemistry, surface science, and nanoscience In Spectroscopy for Materials Characterization, accomplished researcher Simonpietro Agnello delivers a practical and accessible compilation of various spectroscopy techniques taught and used to today. The book offers a wide-ranging approach taught by leading researchers working in physics, chemistry, surface science, and nanoscience. It is ideal for both new students and advanced researchers studying and working with spectroscopy. Topics such as confocal and two photon spectroscopy, as well as infrared absorption and Raman and micro-Raman spectroscopy, are discussed, as are thermally stimulated luminescence and spectroscopic studies of radiation effects on optical materials. Each chapter includes a basic introduction to the theory necessary to understand a specific technique, details about the characteristic instrumental features and apparatuses used, including tips for the appropriate arrangement of a typical experiment, and a reproducible case study that shows the discussed techniques used in a real laboratory. Readers will benefit from the inclusion of: Complete and practical case studies at the conclusion of each chapter to highlight the concepts and techniques discussed in the material Citations of additional resources ideal for further study A thorough introduction to the basic aspects of radiation matter interaction in the visible-ultraviolet range and the fundamentals of absorption and emission A rigorous exploration of time resolved spectroscopy at the nanosecond and femtosecond intervals Perfect for Master and Ph.D. students and researchers in physics, chemistry, engineering, and biology, Spectroscopy for Materials Characterization will also earn a place in the libraries of materials science researchers and students seeking a one-stop reference to basic and advanced spectroscopy techniques.

The aim of this text is to present the background, the important concepts, and tabulated data of Auger electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) in a practical context for those involved in applied surface analysis techniques.

In 1970 when I first seriously contemplated writing a book on electron spectroscopy, I recognized the impossibility of completely reaching my desired goals. First, the field was expanding (and still is) at such a rate that a definitive statement of the subject is not possible. The act of following the literature comprehensively and summarizing its essential content proved to be a diver gent series. On the other hand, the field has increased to such a size that violent changes in its basic makeup no longer occur with the frequency that was present in its early days. Furthermore, the excitement of electron spectro scopy lies in its many-faceted interrelationships. In the era of specialization, electron spectroscopy is an open-ended subject continually bringing together new aspects of science. I wished to discuss not just one type of electron spectro scopy, but as many as would be possible. The book as it stands concentrates its attention on x-ray photoelectron spectroscopy, but also presents the basis of Auger electron spectroscopy and uv photoelectron spectroscopy, as well as mentioning many of the other branches of the field. A large, many-author volume might be an answer to some of these problems. However, though anyone person possesses only a limited amount of expertise, I have always enjoyed books by a single author since what they lack in detailed knowledge they gain in a unified viewpoint. I hope the final product, though limited in its attainment of these goals, will still be of some merit.

This guide to the use of surface analysis techniques, now in its second edition, has expanded to include more techniques, current applications and updated references. It outlines the application of surface analysis techniques to a broad range of studies in materials science and engineering. The book consists of three parts: an extensive introduction to the concepts of surface structure and composition, a techniques section describing 19 techniques and a section on applications. This book is aimed at industrial scientists and engineers in research and development. The level and content of this book make it ideal as a course text for senior undergraduate and postgraduate students in materials science, materials engineering, physics, chemistry and metallurgy.